X-ray diffraction at elevated temperatures : a method for in situ process analysis /
Guardado en:
| Otros Autores: | |
|---|---|
| Formato: | Libro |
| Idioma: | English |
| Publicado: |
New York :
VCH,
c1993.
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| Materias: | |
| Etiquetas: |
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| LEADER | 00837pam a22002415a 4500 | ||
|---|---|---|---|
| 001 | EIQ.libpla004017 | ||
| 008 | 920610s1993####nyua#####b####001#0#eng#d | ||
| 005 | 20080429155541.0 | ||
| 245 | 0 | 0 | |a X-ray diffraction at elevated temperatures : |b a method for in situ process analysis / |c D.D.L. Chung ... [et al.]. |
| 260 | |a New York : |b VCH, |c c1993. | ||
| 300 | |a viii, 268 p. : |b il. ; |c 24 cm. | ||
| 504 | |a Incluye referencias bibliográficas e índice. | ||
| 020 | |a 0895737450 | ||
| 020 | |a 3527278427 | ||
| 700 | 1 | |a Chung, Deborah D. L. | |
| 082 | 0 | 0 | |a 548/.83 |2 20 |
| 650 | 4 | |a Rayos-X |x Difracción. | |
| 650 | 4 | |a Rayos-X |x Aplicaciones industriales. | |
| 650 | 0 | |a X-rays |x Diffraction. | |
| 650 | 0 | |a X-rays |x Industrial applications. | |
| 010 | |a 92021803 | ||
| 040 | |a DLC |c DLC |d AR-BbSID | ||
| 859 | |a AR-BbSID |b BIB. PLAPIQUI |h 548.83 |i Ex 81 |p 5511 | ||